33250 Semiconductor Processes |
Danish title: Halvlederkomponenters teknologi |
Language: English ECTS-creditpoints: 5, External examination.
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Exam schedule:
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F3-B (jun 03 2002), E3-B (dec 17 2001) |
Recommended semester: 7th - 9th semester |
Scope and form: One 4 hour session every week with lectures, problems, and experiments. |
Evaluation: Oral exam
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Examination: 13-scale |
Previous course: 44250 |
Prerequisites: 10207.21010 / 10004 / 10005 |
No credit points with: 44250 |
Participant limitation: Max. 30 |
Aim: To teach the student to: 1) use and evaluate available processes for fabrication of integrated circuits and semiconductor devices. 2) understand the equipment and the methods used in fabrication. 3) based on this knowledge, make detailed process descriptions for the fabrication of integrated circuits and semiconductor devices. 4) evaluate the results of the processing and understand the connection between the physical models used and the fabrication procedure used. |
Contents: Physics and chemistry of semiconductor process technologies, including: Crystal growth, epitaxy, thin film technology, low pressure CVD, thermal oxidation, solid state diffusion, ion implantation, wet and dry etching, micro lithography, encapsulation, and electrical and physical evaluation of materials. |
Remarks: Basic knowledge on solid state electronics and physical chemistry is required. The course will run for the last time in the spring 2001. |
Contact: Ole Hansen, building 345ø, (+45) 4525 5715, oh@mic.dtu.dk |
Department: 033 Mikroelektronik Centret |
Keywords: semiconductor technology, micro technology |
Updated: 08-05-2001 |
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