| Recommended semester: At any time during the study |
| Scope and form: Experimental work for 3 weeks 8 hours a day. |
| Evaluation: Approval of coursework/reports
|
| Examination: Pass/fail |
| Previous course: 44470 |
| Prerequisites: 10207.21010 / 10004 / 10005 |
| No credit points with: 44470 |
| Aim: To introduce the experimental techniques used in the fabrication and characterization of semiconductor devices. |
Contents: The course is an experimental project, and the content of the project is strongly related to the ongoing research at MIC. Hence, the actual subjects vary from term to term. Examples of previous projects:
Evaluation of CMOS-SOI transistors.
Optimisation of External Boron Base Implants for SiGe HBT transistors.
Optimisation of the Growth Conditions for Reactive Sputtering of Tantalum Oxide.
Interrelation of the Growth Conditions and the Piezo-coefficient of Polysilicon. |
| Contact: Ole Hansen, building 345ø, (+45) 4525 5715, oh@mic.dtu.dk |
| Department: 033 Mikroelektronik Centret |
| Keywords: semiconductor technology, semiconductor devices, microtechnology, microlithography, thin films |
| Updated: 07-05-2001 |
