|
|
| Offered by:
Mikroelektronik Centret
(MIC) |
| No credit points with: C4482 |
| Compulsory: 44201/44203/44207/44210/44250/44251 *) |
| Recommended semester:
7th semester |
| Limitation: Max. 12 |
| Scope and form: Experimental work for 14 weeks. |
| Examination:
Evaluation of report(s)
(13 point scale
) |
| Contact person: |
Otto Leistiko, MIC, Building 349, Tel. +45 4525 6304 |
|
| Aim: To train the student in the fabrication and characterization of semiconductor materials, structures, and devices. The course will allow the student to participate in an on-going research project at MIC. |
| Contents: Experimental work within Microelectronic Centre's research program in the laboratories of MIC and the students laboratory in the clean room facility: CMOS on silicon-on-insulator technology development; SiGe heterostructure bipolar transistor fabrication and testing; Femtosecond spectroscopy of carrier dynamics in quantum semiconductor structures; Fabrication and testing of active and passive planar, integrated optics components; Micromechanical components: fabrication and testing of mechanical properties. |
